Takanori Mimura

(三村和仙)

Profile Information

Affiliation: assistant professor, Gakushuin University

Degree: 博士（工学）(Mar, 2020, 東京工業大学物質理工学院材料系)

Researcher number: 40965802
ORCID ID: https://orcid.org/0000-0003-1358-2962
J-GLOBAL ID: 202201019029384944
researchmap Member ID: R000034961

Research Interests

Research Areas

Nanotechnology/Materials / Inorganic compounds/materials chemistry /

Research History

Sep, 2022 - Present

東京工業大学特別研究員
Apr, 2022 - Present

Gakushuin University
Aug, 2020 - Mar, 2022

Post-Doctoral Research Associate, Department of Materials Science and Engineering, University of Virginia
Apr, 2020 - Jul, 2020

Tokyo Institute of Technology
Apr, 2017 - Mar, 2020

日本学術振興会特別研究員 DC1

Education

Apr, 2017 - Mar, 2020

School of Materials and Chemical Technology, Tokyo Institute of Technology
Apr, 2015 - Mar, 2017

Tokyo Institute of Technology
Apr, 2013 - Mar, 2015

Civil Engineering, Gunma National College of Technology

Awards

Papers

Data-Driven Analysis of High-Resolution Hyperspectral Image Data Sets through Nanoscale Capacitance–Voltage Measurements to Visualize Ferroelectric Domain Dynamics

Yoshiomi Hiranaga, Yuki Noguchi, Takanori Mimura, Takao Shimizu, Hiroshi Funakubo, Yasuo Cho

ACS Applied Nano Materials, 7(8) 8525-8536, Apr 9, 2024
Phase Identification of 850 nm Thick 7%YO_1.5–93%HfO₂ Films by Surface and Cross-Sectional Raman Spectroscopies

Takanori Mimura, Yuma Takahashi, Takahisa Shiraishi, Masanori Kodera, Reijiro Shimura, Keisuke Ishihama, Kazuki Okamoto, Hiroki Moriwake, Ayako Taguchi, Takao Shimizu, Yasuhiro Fujii, Akitoshi Koreeda, Hiroshi Funakubo

ACS Applied Electronic Materials, 6(4) 2500-2506, Apr 5, 2024
No‐Heating Deposition of Ferroelectric x%YO1.5–(100−x%)(Hf1−yZry)O2 Films

Takanori Mimura, Reijiro Shimura, Akinori Tateyama, Yoshiko Nakamura, Takahisa Shiraishi, Hiroshi Funakubo

physica status solidi (a), Jun 25, 2023
Systematic Investigation of Ferroelectric Properties in x%YO1.5–(100–x%)Hf1–yZryO2 Films

Takanori Mimura, Yuki Tashiro, Takao Shimizu, Hiroshi Funakubo

ACS Applied Electronic Materials, Mar 28, 2023
Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films

Shelby Fields, Truong Cai, Samantha T. Jaszewski, Alejandro Salanova, Takanori Mimura, Helge H. Heinrich, Michael David Henry, Kyle P. Kelley, Brian W. Sheldon, Jon F. Ihlefeld

Advanced Electronic Materials, 8(12) 2200601-2200601, Dec, 2022

Misc.

Thermal Hysteresis During Ferroelectric Transition in HfO₂-based Materials

三村和仙, 清水荘雄, 清水荘雄, 坂田修身, 坂田修身, 舟窪浩

日本物理学会講演概要集(CD-ROM), 77(1), 2022
Emergence of ferroelectricity in Y-substituted HfO₂

清水荘雄, 清水荘雄, 田代裕貴, 三村和仙, 舟窪浩

日本セラミックス協会秋季シンポジウム講演予稿集(Web), 34th, 2021
Nanoscale Mapping of Domain Switching Behavior in Ferroelectric Films

平永良臣, 三村和仙, 清水荘雄, 舟窪浩, 長康雄

応用物理学会春季学術講演会講演予稿集(CD-ROM), 68th, 2021
Preparation of Y doped HZO ferroelectric thick films at room temperature by the sputtering method and their electrical and piezoelectric properties

志村礼司郎, 三村和仙, 舘山明紀, 清水荘雄, 清水荘雄, 白石貴久, 舟窪浩

応用物理学会春季学術講演会講演予稿集(CD-ROM), 68th, 2021
Raman spectroscopy of ferroelectric HfO₂-based films

高橋雄真, 白石貴久, 小寺正徳, 志村礼司郎, 三村和仙, 森分博紀, 田口綾子, 舟窪浩

応用物理学会秋季学術講演会講演予稿集(CD-ROM), 82nd, 2021

Presentations

High pressure synthesis of ferroelectric bulk Y doped HfO2

Takanori Mimura, Naoki Noda, Yoshiyuki Inaguma

13th Korea-Japan Conference on Ferroelectrics (KJC-FE13), Sep 27, 2022 Invited
Stabilization of ferroelectric phase in epitaxial HfO2 based films

Takanori Mimura, Yu-ki Tashiro, Hiroshi Funakubo, Takao Shimizu, Hiroshi Uchida, Yoshio Katsuya, Osami Sakata

IEEE IFCS-ISAF 2020 Conference, Jul 20, 2020 Invited

Teaching Experience

Apr, 2022 - Present

kisokagaku (Gakushuin University)
Apr, 2022 - Present

Chemistry experiment (Gakushuin University)
Apr, 2022 - Present

Exercise in Chemistry (Gakushuin University)

Research Projects

任意の特性を発現する新規ハフニア基強誘電体の創生

科学研究費助成事業特別研究員奨励費, 日本学術振興会, Apr, 2017 - Mar, 2020

三村和仙

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