Using a mesh grid bias method for plasma parameter control, volume production of hydrogen negative ions H" is studied in pure hydrogen rf plasmas. Relationship between the extracted H" ion currents and plasma parameters is discussed. Both high and...
Novel Materials Processing by Advanced Electromagnetic Energy Sources 55-58 2005年 [査読有り]
This chapter discusses the varying magnetic field intensity of the magnetic field (MF), plasma parameter control in hydrogen (H2), deuterium (D2) plasmas, and its influence on H/D production. The relationship between H/D density distribution and p...
人文科学研究科